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With The Evactron^® RF plasma cleaner you get SEM
images with higher resolution and contrast, carbon free EUV optics and superior fine vacuum film coatings!

How Evactron^® RF Plasma Cleaning Works

 Typical SEM Oil Contamination Problems Solved by Evactron cleaning:

The Causes: Specimen borne hydrocarbons, Oil Backstreaming, oil built-in during manufacturing, poor vacuum practice, dirty specimens, and the environment.

The Solution: Plasma cleaning inside the SEM and other high vacuum chambers. The Evactron process is better than traps or dry pumps because it actively removes all hydrocarbons rather than trying to stop the source.

About XEI Scientific

XEI was founded in 1991 to make and sell anticontamination systems for the Electron Microscope community. The EVACTRON Anticontaminator, an RF plasma activated cleaning system, was introduced in 1999 to provide a faster and more complete cleaning process. Over 750 Evactron Anticontaminators have been installed world wide as of June 2008.

EVACTRON® is a registered trademark of XEI Scientific.

Sales and quotations: sales@evactron.com, 1 (415) 566-5774,
fax 1 (415) 566-9779

Search Engine Topics:

The Evactron De-contaminator is a Anti-Contamination Accessory or plasma cleaner for Electron Microscopes. An Electron Microscope Decontaminator using plasma ashing or RF plasma cleaning for Hydrocarbon and organic contamination control in vacuum systems. The Evactron D-C stops black squares and gives raster burn control in SEMs and ion beam instruments. Electron cleaning will stop oil drip from X-ray windows. The Evactron RF plasma asher does plasma cleaning of high vacuum systems, and instruments such as FIB and SEM and is similar to glow discharge cleaning but is sputtering free cleaning.
Adventitious carbon and other hydrocarbon removal in vacuum chambers is done by the Evactron Decontaminator also know as a SEM Anti-contaminator and SEM Anticontaminator. Adventitious carbon is the term some surface scientists use to refer to "the ubiquitous (adventitious) carbon that seems to exhibit an instantaneous presence on all air exposed materials. Plasma cleaning and RF Plasma ashing of vacuum chambers with the Evactron D-C results in Organic Contamination control and removal.
Cleaning Organics and AMC (atmospheric molecular contamination)from high vacuum systems is done with an Evactron anticontaminator, an anticontamination system for SEM and FIBs and vacuum systems. The Evactron D-C does EDX and EDS window cleaning and RF Plasma Ashing in Electron Microscopes.

Mounted on a chamber port the compact Evactron Oxygen Radical Source uses a low power RF plasma to generate oxygen radicals from admitted air. Hydrocarbons are oxidized in low vacuum to H2O, CO, and CO2 molecules that are carried by convection to the roughing pump and exhausted from the chamber. The Evactron Anti-Contaminator system safely cleans the chamber, stage,samples, and x-ray detector windows regardless of the source of contamination.

XEI Scientific solves hydrocarbon contamination problems in Electron Microscopes and other high vacuum systems by RF plasma (glow discharge) cleaning with EVACTRON® plasma activated oxidation using air as the oxygen source. The Evactron® anticontamination system produces Oxygen radicals for a fast, chemically reactive, oil and hydrocarbon removal process that is safe for most surfaces.

The Results:

• Stops scan deposits - removes the veil of contamination
  
• Improves resolution
  
• Maximizes low energy X-ray sensitivity - removes oil on Xray windows

• Increases precision - proven to stop CD SEM metrology drift

• Cleans specimens in-situ on the stage and in the microscope.

Improves SEM (Scanning Electron Microscope)
and FIB (Focus Ion Beam) performance:

resolution 3nm on FE SEM (Hitachi S4700) @5KV after Evactron Cleaning: