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Cleans Scanning Electron Microscopes (SEMS)
See you at the M & M Conference August 2008
Evactron® RF Plasma Cleaner removes atmospheric molecular contamination, improves scanning electron microscope (SEM) performance. Cleans vacuum chambers and substrates improving adhesion and uniformity of fine vacuum coatings. The Evactron De-Contaminator is a RF plasma asher for external mounting on vacuum chambers and electron microscopes. Low power up to 20 Watts! Uses air for gentle oxidation.
Evactron® cleaning removes contamination artifacts in so you get great SEM photos!

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How
to contact us:
XEI Scientific, Inc.
1755 East Bayshore Rd, Suite 17
Redwood City, CA 94063
Phone 1 (650) 369-0133
1 (800) 500-0133
FAX 650-363-1659
General technical inquiries:
information@evactron.com
Sales and quotations:
Sales@evactron.com
1 (415) 566-5774 fax 1 (415) 566-9779
Click on Skype button for Vincent Carlino XEI sales
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Cleaner Substrates for fine vacuum coatings
Latest News For Cleaner Substrates !
XEI Scientific, Inc. introduced our line of Evactron® RF Plasma cleaners at the Vacuum Coaters Society Meeting April 19 - 24, 2008 in Chicago, Illinois. Dr. Christopher G. Morgan gave a presentation on the gentle cleaning of vacuum chambers using
Evactron® remote plasma, see paper.
Another interesting presentation was by a researcher Elisabeth Strein, working with Prof. David Allred at Brigham Young University. A "green" cleaning technique for Si/SiO2 ultrathin films was presented titled: Eliminating adventitious carbon contamination on silicon wafers.
An Evactron® plasma cleaner was adapted fpr adventitious carbon removal and to minimize the effects of instrumental contamination, i.e. XPS system hydrocarbon deposits on the surface of samples.
XEI Scientific, Inc joined a National Science Foundation (NSF) research group.
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New Evactron De-Contaminators (D-C)
Evactron® 25 Tabletop D-C
Evactron® 45 Rackmounted D-C
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